Efficient power management method in integrated circuit through a nanotube structure

ABSTRACT

Efficient power management method in integrated circuit through a nanotube structure is disclosed. In one embodiment, a method includes patterning a nanotube structure adjacent to a transistor layer of an integrated circuit. The transistor layer may be above a semiconductor substrate. The transistor layer above the semiconductor substrate may comprise a plurality of transistors. The method also includes supplying power to the plurality of transistors through one or more power sources. In addition, the method includes coupling the plurality of transistors in the transistor layer to the one or more power sources based on a state of the nanotube structure.

CLAIM OF PRIORITY

This is a divisional application and claims priority from a U.S.Non-Provisional application Ser. No. 11/286,558 titled “CONFIGURABLEPOWER SEGMENTATION USING A NANOTUBE STRUCTURE” filed on Nov. 23, 2005.

FIELD OF TECHNOLOGY

This disclosure relates generally to the technical fields ofsemiconductor devices, and more particularly, to power management, powersegmentation, and interconnects fabric of an integrated circuit.

BACKGROUND

Conventional power management techniques (e.g. setting power of avoltage region) in an integrated circuit are static in nature (e.g.,determined during a design phase). One such technique may involve usinga low-voltage integrated circuit to reduce an amount of power required.However, this may reduce the integrated circuits performance (e.g.,maximum operable frequency may be lower).

Another technique involves assigning multiple pre-determined powerregions with power regulators (e.g., to create different voltage levelson different parts of the integrated circuit). Multiple pre-determinedpower regions may be formed by combining lower and/or higher voltagecircuits in the integrated circuit using custom power planes. In thiscase, expensive custom masks and/or specialized circuits that have afixed association with a specific voltage plane may be required.

The integrated circuit may draw significant power even when not in usebecause of the static power management of conventional techniques. Also,leakage (e.g., undesired current that flows when a transistor is in the“off” state; for example, MOS/CMOS devices using ultra-thin gate oxideleakage current is primarily a tunneling current across the gate oxide)may reduce battery life of a device incorporating the integratedcircuit, and/or may cause overheating of the integrated circuit.

SUMMARY

Efficient power management method in integrated circuit through ananotube structure is disclosed.

In one aspect, a method includes patterning a nanotube structureadjacent to a transistor layer of an integrated circuit. The transistorlayer may be above a semiconductor substrate. The transistor layer abovethe semiconductor substrate may comprise a plurality of transistors. Themethod also includes supplying power to the plurality of transistorsthrough one or more power sources. In addition, the method includescoupling the plurality of transistors in the transistor layer to the oneor more power sources based on a state of the nanotube structure.

In another aspect, a method includes patterning a nanotube structureadjacent to a transistor layer of an integrated circuit. The transistorlayer above a semiconductor substrate may comprise a plurality oftransistors. Further, the method may include coupling the plurality oftransistors in the transistor layer to one or more power sources basedon a state of the nanotube structure.

In yet another aspect, a method includes patterning a nanotube structureadjacent to a transistor layer of an integrated circuit. The transistorlayer above a semiconductor substrate may comprise a plurality oftransistors. The method also includes supplying power to the pluralityof transistors through one or more power sources. In addition, themethod includes bending the nanotube structure towards a conductivesurface when a current is applied to the nanotube structure. The methodalso includes coupling the one or more power sources to the plurality oftransistors to provide a power to the plurality of transistors throughthe nanotube structure that is bent towards the conductive surface. Themethod further includes bending the nanotube structure away from theconductive surface when the current applied to the nanotube structure isremoved. In addition, the method includes decoupling the one or morepower sources from the plurality of transistors to remove the power fromthe plurality of transistors through the nanotube structure that is bentaway from the conductive surface.

In a further aspect, a method includes supplying a power to a powerregion of a device through an at least one power source via a nanotubestructure of the device. The power region may comprise a plurality oftransistors in a transistor layer above a semiconductor layer of thedevice. The method also includes providing a default configuration ofthe power region to the device comprising a power region. The defaultconfiguration may be a state of the power region based on an initialallocation of power to the power region. The method further includesmonitoring the power region to check for a condition that triggers achange in the default configuration. The condition that triggers thechange in the default configuration may be associated with a usage ofthe power region. The method includes altering the default configurationbased on the usage of the power region.

Other aspects will be apparent from the following description and theappended claims.

BRIEF DESCRIPTION OF THE VIEWS OF DRAWINGS

Example embodiments are illustrated by way of example and not limitationin the figures of accompanying drawings, in which like referencesindicate similar elements and in which:

FIG. 1 is a three-dimensional inner view of a device having a nanotubestructure, according to one embodiment.

FIG. 2 is a cross-sectional view of the transistor layer having aplurality of voltage regions, according to one embodiment.

FIG. 3 is a perspective view of a single power source configurationcoupled to a programmable power region using a nano-switch, according toone embodiment.

FIG. 4 is a perspective view of a multiple source configuration havingtwo power sources coupled to a programmable power region using anano-switch, according to one embodiment.

FIG. 5 is a componential view of programmable interconnects layershaving the nanotube structure as a switch, according to one embodiment.

FIG. 6 is table views of routing paths that may be configured in theprogrammable interconnect layers of FIG. 5, according to one embodiment.

FIG. 7 is a process flow to manage the group of transistors of FIG. 1using the nanotube structure, according to one embodiment.

FIG. 8 is a process flow to form the power region of FIG. 1 using thenanotube structure, according to one embodiment.

FIG. 9 is a process flow to form a programmable interconnect layer whichprovides a plurality of routing, according to one embodiment.

FIG. 10 is a process flow of a device to alter a change in a defaultpower configuration, according to one embodiment.

Other features of the present embodiments will be apparent fromaccompanying Drawings and from the Detailed Description that follows.

DETAILED DESCRIPTION

Efficient power management method in integrated circuit through ananotube structure is disclosed. In the following description, numerousspecific details are set forth in order to provide a thoroughunderstanding of various embodiments. It will be evident, however, toone skilled in the art that the various embodiments may be practicedwithout these specific details. An example embodiment provides methods,structures, and systems to form multiple power regions (e.g., specificpower regions for diffused microprocessor, memories, etc.) in anintegrated circuit using a nanotube structure and a plurality of powersources.

Another example embodiment provides methods, structures, and systems tomanage power consumption of the multiple groups of transistors (e.g., ata fabrication level as well as post the fabrication level) to minimizeleakage in the integrated circuit by configuring and/or programming thenanotube structure and/or the plurality of power sources. In yet anotherexample embodiment, methods, structures, and systems are introduced toform a route based on a programmable interconnect layer having aplurality of the nanotube structures. It will be appreciated that thevarious embodiments discussed herein may/may not be the same embodiment,and may be grouped into various other embodiments not explicitlydisclosed herein.

FIG. 1 is a three-dimensional inner view of a device 100 (e.g., amicroelectronic assembly) having nanotube structures 116, according toone embodiment. In FIG. 1, the device 100 is formed to include asemiconductor substrate 102, a transistor layer 104, any number of metallayers 106, an optional coating layer 108, and other layers 110 (e.g.,formed one above another). In one example embodiment, a nanotubestructure 116A patterned in the metal layers 106 may be coupled to agroup of transistors 112A (e.g., the power region may be circuit thatperforms a function, and which includes transistors that perform aparticular function) having a plurality of transistors through a voltageline (connector between the nanotube structure 116 and the group oftransistors 112). It should be noted that nanotube structure 116B may beformed in one or more of the metal layers 116. In alternate embodiments,the nanotube structure 116A may be patterned in the semiconductorsubstrate 102. Also illustrated in FIG. 1, the nanotube structure 116Bis connected to a group of transistors 112B having the plurality oftransistors through a voltage line (e.g., connector between the nanotubestructure 116B and the group of transistors 112B).

In one embodiment, the nanotube structures 116 of FIG. 1 are cylindricalcarbon molecules which exhibit extraordinary strength and uniqueelectrical properties. The nanotube structures 116 may include at leastone end capped with a hemisphere of a buckyball structure (e.g.,spherical shape),In one embodiment, a diameter of a nanotube structure116 is less than 5 nanometers. In one embodiment, the nanotubestructures 116 may be either single-walled nanotubes (SWNTs) and/ormulti-walled nanotubes (MWNTs) depending on the application andproperties desired.

The nanotube structures 116 may be composed entirely of sp² bonds,similar to graphite. The nanotube structures 116 may align themselvesinto “ropes” held together by Van der Waals forces (e.g., intermolecularforces that deal with forces due to the polarization of molecules). Ifone or more of the nanotube structures 116 are SWNTs, they may have adiameter of close to 1 m, with a tube length that can be many thousandsof times larger (e.g., a structure of a SWNT can be conceptualized bywrapping a one-atom-thick layer of graphite into a seamless cylinder).The nanotube structures 116 may have a tensile strength of 63 GPa andmay have an elastic modulus, in the order of 1 Tpa.

Under excessive tensile strain, the nanotube structures 116 may undergoplastic deformation (e.g., a permanent and/or semi-permanentdeformation). The structure of the nanotubes 116 may affect theirelectrical properties. For a given (n, m) nanotube structure 116 of FIG.1, if 2n+m=3q (where q is an integer), then the nanotube structure 116is metallic, otherwise the nanotube is a semiconductor. Thus allarmchair (n=m) nanotubes may be metallic, and nanotubes (5, 0), (6, 4),(9, 1), etc. may all be semiconducting. An alternative (equivalent)representation of this condition is if (n−m)/3=integer, then the SWNTmay be metallic. In theory, metallic nanotubes can have an electricalcurrent density more than 1,000 times stronger than metals such assilver and copper. The nanotube structures 116 may thermal conductorsalong the tube, (e.g., exhibiting a property known as “ballisticconduction”) but good insulators laterally to the tube axis.

The nanotube structures 116 of FIG. 1 may have conductive propertiesthat make them ideal components of electrical circuits. In oneembodiment, the nanotube structures 116 of FIG. 1 are grown through achemical vapor deposition process (e.g., a process for depositing thinfilms of various materials, such as when substrate is exposed to one ormore volatile precursors, which react and/or decompose on the substratesurface to produce the desired deposit) from patterned catalyst materialon a wafer, which serve as growth sites and allow designers to positionone end of the nanotube. During the deposition process, an electricfield can be applied to direct the growth of the nanotubes, which tendto grow along the field lines from negative to positive polarity. Thenanotube structures 116 may be self assembled using chemical orbiological techniques to place the nanotubes from solution todeterminate place on a substrate. Alternatively, in another embodiment,the nanotube structures 116 of FIG. 1 are manipulated with an atomicforce microscope.

The nanotube structures 116 may be formed based on a sputtered planarprocess (e.g., adhering a thin film on a layer) performed in a trench(e.g., with a depth of at least 10 nanometer which may allow a nanotubematerial of the nanotube structure 116A to flex) on the semiconductorsubstrate 102 (e.g., the nanotube structure 116B may be formed in themetal layers 106 using a similar process). For example, in oneembodiment, the nanotube structures 116 are created through a physicalprocess whereby atoms in a solid target material (e.g., carbon) areejected into the gas phase due to bombardment of the material byenergetic ions (e.g., thin-film deposition).

The sputtered atoms (e.g., of carbon), and/or those ejected into the gasphase, may not be in their thermodynamic equilibrium state. Therefore,they may condense back into the solid phase (e.g., to form the nanotubestructures 116 of FIG. 1) upon colliding with any surface in thesputtering chamber (e.g., a patterned wall in the semiconductorsubstrate 102 of FIG. 1). This may result in deposition of the sputteredmaterial (e.g., carbon) on all surfaces inside the chamber (e.g., todeposit thin films of carbon material to form the nanotube structures116 of FIG. 1).

At least one power source (e.g., not shown) may be attached to thenanotube structure 116A to provide power to a power region (e.g., thegroup of transistors 112A) in the transistor layer 104 (e.g., the atleast one power source may be attached to the section of the transistorlayer 104 having the nanotube structure 116B adjacent to at least one ofthe metal layers 106 to form the group of transistors 112B).

One or more power sources may be connected to the group of transistors112 when the nanotube structures 116 are bent (e.g., indicating “on”state, may be bent when a current is applied to the nanotube structures116), whereas the at least one power source may be disconnected from thegroup of transistors 112 when the nanotube material of the nanotubestructures 116 is unbent (e.g., indicating “off” state, e.g., when thecurrent is removed from the nanotube structures 116, and/or reapplied).This concept will be described in greater detail in FIG. 2 and in FIG.3. The “on” and “off” state of the nanotube structures 116 may beconfigured when the nanotube structures 116 receive a command from adata processing system. The device 100 may have a plurality of powersections based on a state of the nanotube structures 116 and/or one ormore power sources.

In another example embodiment, the device 100 may programmaticallymanage power (e.g., electricity) allocation to the group of transistors112. The state of nanotube structures 116 (e.g., having a tensilestrength of at least 63 GPa and/or an elastic modulus of at least 1 TPa)may be altered based on an algorithm of an application program (e.g.,software and/or hardware) associated with the device 100.

In yet another embodiment, the device 100 may include a programmableinterconnect layer (e.g., a programmable interconnect layer 500 of FIG.5) patterned in at least one of the metal layers 106 and/or thesemiconductor substrate 102 to determine power allocation in the groupof transistors 112 of the transistor layer 104 and provide aprogrammable routing based on the nanotube structures 116.

FIG. 2 is a cross-sectional view of the transistor layer 104 having aplurality of voltage regions, according to one embodiment. In FIG. 2,the transistor layer 104 of FIG. 1 may have the plurality of voltageregions with an interconnected set of grid 206 (e.g., each square in thegrid may include 1 million transistors for example). Each of theplurality of voltage regions may be allocated for a group of transistorsreserved for a specific function (e.g., a voltage region 200 oftransistors forming memory devices, a voltage region 202 formingregisters, a voltage region 204 forming a microprocessor, etc.). Thevoltage regions may be formed at a design level and/or at a fabricationlevel. A current may be applied to a nanotube structure (e.g., thenanotube structure 116A of FIG. 1), to provide power to the voltageregion 202 in one example. Alternatively, power to the voltage region204 may be removed when the transistors in the voltage region 204 arenot being utilized (e.g., the nanotube structure 116B may be uncoupledfrom a metal plate).

FIG. 3 is a perspective view of a single power source 302 coupled to aprogrammable power region 306 using a nano-switch 304 (e.g., a carbonnanotube switch and/or CNT switch), according to one embodiment. In FIG.3, which displays a single source configuration 300, the power source302 and/or the nano-switch(s) 304 (e.g., an embodiment of the nanotubestructures 116 of FIG. 1) may be configured at a fabrication leveland/or programmed post the fabrication level to set up a power (e.g.,voltage) in the programmable power region 306. When a current is appliedto the nano-switch 304, the power source 302 may be electricallyconnected with the programmable power region 306. The programmable powerregion 306 may be isolated from the single power source 302 when thenano-switch 304 is turned off (e.g., thereby minimizing leakage whentransistors in the programmable power region 306 are not in use). Itshould be noted that other effective topologies are possible and thisembodiment is an example.

There are two states (e.g., a binary state determined by a currentapplied to the nanotube structure 116) of power when the single powersource 302 is coupled to the programmable power region 306. In oneexample embodiment, a system consisting of the integrated circuit havingthe nanotube structures 116 patterned on it and hardware and/or asoftware device to control the nanotube structures 116 may be used toallocate multiple power sources in the integrated circuit (e.g., as willbe later described in FIG. 4). The multiple power regions may beassociated/formed based on the settings of the programmable carbonnanotube structure 116 (e.g., carbon nanotube switch patterned adjacentto the transistor layer 104 and at least one power source (e.g., thenano-switch 304 made of a planar carbon nanotube film patterned on theintegrated circuit which form electrically programmable persistentmechanical switches).

FIG. 4 is a perspective view of a multiple source configuration 400having two power sources (e.g., a power source 410 and a power source412) coupled to a programmable power region 406 using nano-switches 404and nano-switches 408, according to one embodiment. While two powersources are shown FIG. 4, alternate embodiments may include any numberof power sources associated with the programmable power region 406. Whena voltage of the programmable power region 406 is to be configured, thenano-switch 404 is turned off to disengage all power sources (e.g., thepower source 410 and the power source 412) from the programmable powerregion 406. Next, the nano-switch 404 is configured and/or programmed toset up the voltage (e.g., high, low, or off state for the power region406 having the two power sources).

For the high state, the nano-switches 404 may be turned on while thenano-switches 408 turned off to connect the power source 402 (e.g.,having a higher voltage than the power source 410) to the programmablepower region 406. For the low state, the nano-switches 408 may be turnedon while the nano-switch 404 is tuned off to connect the power source410 (e.g., having a lower voltage than the power source 412) to theprogrammable power region 406. For the off state, both the nano-switches404 and the nano-switches 408 may be turned off to disengage both thepower source 402 and the power source 410 from the programmable powerregion 406 to minimize leakage by transistors in the programmable powerregion 406. In an alternate embodiment, the current capacity of multiplepower sources (e.g., the power source 402 and the power source 410) maybe cascaded (e.g., summed, aggregated, etc.) together to provideincremental current to the programmable power region 406 when both thenano-switch 404 and the nano-switch 408 are turned on (e.g., thenano-switch 404 and/or the nano-switch 408 may be bent into a conductivesurface to signal an “on” state on when current is applied to them).

The groups of transistors 112 of FIG. 1, the programmable power region306 of FIG. 3, and/or the programmable power region 406 of FIG. 4 may bemanaged by a system having a power management module (e.g., hardwareand/or software circuitry) to manage performance of the group oftransistors using at least one carbon nanotube film based switch and adata processing system. The power management module may be as simple asa register interface with flops that drive changes is state of a device(e.g., integrated circuit or portion of an integrated circuit). Forexample, if the device has 64 controllable power regions it could becontrolled with 6 I/O's. Another example in a device that has 64controllable power regions it could be controlled with as few as 6 bitsof register. If a device had 256 controllable power regions it could becontrolled with 8 bits of register data. The decode of these bits woulddrive one value of the decode to the CNT switches in each power regionto set their state. Another simple scenario is to have a single registerbit for each power region and drive the value to the CNT switches ineach power region. Clearly this control module would be independent thepower region (e.g., group of transistors) under its control. These arethe simplest cases where there is one power source and the selection ispower on or power off. Clearly more sophisticated interfaces are easilyimagined. In the case of an “on device” application the module could beextended to include logic that would monitor the device and change theconfiguration based on that monitoring or external commands. In the caseof an “off device” application the application could monitor the deviceand other criteria to set the desired power configuration via an exposedinterface.

In one embodiment, the data processing system (e.g., an integratedcircuit and/or a portion of the transistor layer) may determine autilization rate of the group of transistors on a periodic interval andmay communicate a signal to the group of transistors when theutilization rate drops below a minimum threshold (e.g., may toggle astate of the at least one carbon nanotube based switch). In addition,based on the utilization rate of the group of transistors, powerallocation to the group of transistors may be changed/altered.

FIG. 5 is a componential view of an interconnect layer 500 and aninterconnect layer 504 each including the nanotube structures 116 in theform of switches 506. For example, the interconnect layer 500 and theinterconnect layer 504 each include a S1, S2, S3, S4, S5, and an S6switch. In FIG. 5, an interconnect layer 500 (e.g., patterned to atleast one of the metal layers 106 and/or the semiconductor substrate 102to control power allocation in the group of transistors 112) may includea trench of electrodes. The nanotube structures 116 may be sputteredacross the trench. A planar via 505 may be coupled to a communicationline (e.g., that carries an electrical signal, an optical signal, etc.)associated with the nanotube structure 116 (e.g., the switches 506). Thenanotube structures 116 may be composed of at least one switch 506(e.g., among S1, S2, S3, S4, S5, and S6 of FIG. 5) embedded in theinterconnect layer 500. A planar via (e.g., four of which are shownbetween each of the switches the interconnect layer 500) may provide aconnection point for two switches (e.g., thus, the interconnect layer500 is illustrated as including 4 planar vias for six switches 506).

The programmable interconnect layer of 504 is a similar to theprogrammable interconnect layer 506 except that it has the nanotubestructure 116A/116B oriented perpendicular to the nanotube structure116A/116B of the programmable interconnect layer 506 (e.g., having the 4planar vias for the six switches 506). The infrastructure layer 502(e.g., a layer with structural elements that provide a framework forsupporting the programmable interconnect structure 500 and theprogrammable interconnect structure 504) may be composed of a switchinfrastructure 508 (e.g., a spacer) and a vertical via 510 whichconnects two corresponding planar vias to each other.

In one example embodiment, the programmable interconnect structure 504may be stacked on top of the programmable interconnect structure 500when the infrastructure layer 502 is placed in between two couple theplanar vias of the two programmable interconnect structures using thevertical vias 510. A route in the metal layers 106 (e.g., of FIG. 1) maybe formed when a current is applied to at least one of the switches(e.g., at least one of S1, S2, S3, S4, S5, and S6, each being a nanotubestructure) in the programmable interconnect layer 500/504. Furthermore,a configuration of the route may be formed based on an algorithmassociated with the state and/or activity in the group of transistors112 of the integrated circuit.

FIG. 6 is table views of routing paths 600 that may be configured in theprogrammable interconnect layers 500/504, according to one embodiment.The table view of routing path 600 may include a path 602, a H Layer 604(e.g., an upper layer), and a V Layer 606 (e.g., a lower layer). In oneexample system, the routing paths may be formed when an upperinterconnect layer having a plurality of nanotube structures oriented ina horizontal communication line is coupled to a lower interconnect layerhaving the plurality of nanotube structures oriented in a verticalcommunication line by a plurality of vertical vias 510 that connect theplanar vias of the upper and lower interconnect layer. Based on thesystem, a routing path from H1 to V2 may be formed when S1 and S2 of theH Layer 604 and S4 of the V Layer 606 are turned on while the remainingswitches are turned off. In another routing path which connects H3 toH4, only S4, S5, and S6 of H Layer 604 may be turned on.

The switches in the upper and lower interconnect layers (e.g., theswitches associated with the group of transistors 112 as illustrated inFIG. 1) may be programmable based on an algorithm applied by a dataprocessing system associated with the integrated circuit. The algorithmmay be processed when a utilization rate (e.g., monitored on a periodicinterval by the integrated circuit) drops below a minimum threshold.

FIG. 7 is a process flow to manage the group of transistors 112A/112B ofFIG. 1 using the nanotube structure 116A/116B (e.g., formed from aplanar carbon nanotube film that is patterned and associated with avoltage input of a group of transistors forming the group of transistors112A/112B), according to one embodiment. In operation 702, at least onepower source (e.g., selectable based on frequency of the integratedcircuit and at least one other command received from an applicationprogram) may be allocated to the group of transistors 112A/112B of FIG.1 during fabrication of the integrated circuit. The application programcan monitor the power usage characteristics of the integrated circuit(e.g., device) as well as override the characteristics as determined bythe application. For example, if a section of a device is effectivelyconfigured to be always unused, the application may send a command todisengage that portion of the device from its power source to savepower. In another embodiment, if it is determined that the work load ofthe integrated circuit is such that only a fraction of its overallcapacity is needed, the integrated circuit might be shifted to a lowervoltage/lower frequency combination until more capacity is required.

In another example, when more power is needed than is normal, theintegrated circuit may a have a configuration where it needs to increasethe overall power available to a specific power region. One or moreadditional power source(s) may be added to an existing one to yieldadditional current capacity associated with a particular region. Thus acommand may be received from an application associated with theintegrated circuit, and the integrated circuit may process the commandto alter the power configuration of the integrated circuit. Thisapplication may reside within the integrated circuit itself or beexternal to the integrated circuit or both. It is presumed that theapplication will monitor conditions of interest and adjust the powerconfiguration as needed. This monitoring may be based on a utilizationrate of the power region. The utilization rate may be monitored on aperiodic interval by the integrated circuit, and the command may beprocessed when the utilization rate drops below a minimum threshold.

At least one power source may be allocated to the power region during afabrication of the integrated circuit. The power source may be selectedbased on frequency of the integrated circuit and/or at least one othercommand received from the application program.

The integrated circuit in operation 704 may receive a command based on autilization rate (e.g., which is monitored on a periodic interval by theintegrated circuit) of the group of transistors 112A/112B from theapplication program.

In operation 706, the command (e.g., in a form of current that may beprocessed when the utilization rate drops below a minimum threshold) maybe applied to couple the nanotube structure 116A/116B to a conductivesurface. In operation 708, coupling of the nanotube structure 116A/116B(e.g., made of a material chosen from a group comprising a polymer, acarbon, and/or a composite material) to the conductive surface may takeplace when the command is processed.

The coupling of the nanotube structure 116A/116B to the conductivesurface may result in an enablement (e.g., may be performed during anactivation sequence of the integrated circuit) of the group oftransistors 112A/112B of the integrated circuit according to operation710. This coupling may enable a selection of one or more power segments.The nanotube structure 116A/116B (e.g., a configurable/programmablecarbon nanotube switch based structure) can be made to be programmablewithin the device. This requires the nanotube structure 116A/116B to beaccessible to be configured/programmed by as portion of the deviceitself (e.g., can be accomplished by treating the devices like a memoryelement and making each group of nanotube structures/switches within apower segment group addressable). This control is then made available bythe device to be controlled via a command interface. When commands areprocessed, sections of the integrated circuit may be configured to bepart of no power plane or 1 of n power planes. This may be accomplishedvia configuring/programming the switches.

In operation 712, one or more of power sources may be selected tosupport the group of transistors 112A1112B using an algorithm thatconsiders an activity in the group of transistors 112A/112B of FIG. 1.When transistors in the group of transistors 112A1112B are not in use,the nanotube structure 116A/116B in operation 714 may be turned off(e.g., thereby disengaging the power sources to the group of transistors112A/B) to minimize leakage in the transistors. In operation 716,multiple power sources may be allocated to the group of transistors112A/112B to provide at least three power states (e.g., a high state, alow state, and an off state).

FIG. 8 is a process flow to form the power region (e.g., having thegroup of transistors 112A/112B) of FIG. 1 using the nanotube structure116A1116B (e.g., formed when a planar carbon nanotube film is patternedand associated with a voltage input of a group of transistors formingthe group of transistors 112A/112B), according to one embodiment. Inoperation 802, a nanotube material may be sputtered over a plurality oflayers to form the nanotube structure 116A/116B. The nanotube structure116A/116B may be formed (e.g., with a depth of at least 10 nanometers toenable bending of the nanotube structure 116A/116B) adjacent to at leastone of the metal layers 106 and the semiconductor substrate 102 inoperation 804.

In operation 806, the nanotube structure 116A/116B may be patternedadjacent to the transistor layer 104. A bendable portion of the nanotubestructure 116A/116B may be curved in operation 808 to flex to aconductive surface when the current is applied to the nanotube structure116A/116B. In operation 810, the bendable portion may be bent to coupleat least one power source to the group of transistors 112A/112B. Inoperation 812, the at least one power source may be coupled to the groupof transistors 112A1112B based on a state (e.g., a binary state) of thenanotube structure 116A/116B.

In operation 814, the current is applied to the nanotube structure116A1116B having a polarity that indicates at least one of a bending andan expanding of the nanotube structure 116A/116B. The group oftransistors 112A/112B may be coupled to at least two power sources inoperation 816 to provided cascaded current to the group of transistors112A! 112B. A plurality of group of transistors 112A/112B may be enabledin the integrated circuit having the nanotube structure 116A/116Bpatterned on them and at least one power source coupled to each of theplurality of group of transistors 112A/112B.

FIG. 9 is a process flow to form a programmable interconnect layer500/504 which provides a plurality of routing, according to oneembodiment. In operation 902, an interconnect layer 500 may be formedusing a plurality of nanotube structures 506 (e.g., S1, S2, S3, S4, S5,and S6). The plurality of nanotube structures 506 of operation 904 maybe used to alter a route when the current is applied to at least one ofthe plurality of nanotube structures 506. In operation 906, a carbonnanotube film may be patterned in the metal layers 106 to form thenanotube structures 506 (e.g., in a form of switch).

To create the nanotube structures 506, a sputtered planar process may beperformed across a trench of electrodes in operation 908. In operation910, the trench with a depth of at least 10 nanometers and a width of atleast 100 nanometers may be formed to encompass the bendable portion ofthe plurality of nanotube structures 506. The planar via 505 coupled toa communication line associated with each of the plurality of nanotubestructures 506 may be formed in operation 912.

In operation 914, interconnect layers 500/504 in multiple numbers may bestacked by aligning (e.g., to allow neighboring interconnect layers500/504 separated by planar vias 505 include communication lines thatare perpendicularly oriented with respect to each of the neighboringinterconnect layers 500/504) the planar vias 505 so that each of theplurality of nanotube structures 506 is communicatively coupled. Inoperation 916, the route in the metal layers 106 may be altered when thecurrent is applied to at least one of the nanotube structures 506 (e.g.,through an algorithm that considers the activity in the group oftransistors 112A/112B and other groups of transistors of the integratedcircuit).

FIG. 10 is a process flow of a device to alter a change in a defaultpower configuration, according to one embodiment. In operation 1002, adefault configuration may be provided to a device (e.g., the device 100)having various power regions (e.g., such as a power region formed by thegroup of transistors 116B). In operation 1004, the default configuration(e.g., a default configuration may be an initial allocation of power tothe group of transistors 116B) can be altered based on usage (e.g.,activity) of the various power regions. In operation 1006, various powerregions can be monitored to check for at least one condition (e.g., asleep state, a dormant activity of the group of transistors 116B, etc.)that triggers a change in the default power configuration. Then, incondition 1008, it is determined if a change is needed (e.g., aparameter governing activity level of the group of transistors 116Bdrops below a threshold level). If a chance is needed, then a number ofconditions are monitored including whether power should be removed 1010,whether power should be enabled 1012, whether power should be switchedto another source 1014, whether current should be added 1016, and/orwhether current should be removed 1018. If any of these conditions aretrue, then the appropriate operations are performed (e.g., remove power,enable power, switch power, add power, and/or remove current asillustrated in FIG. 10). Then, in condition 1020, it is determinedwhether more regions need to be considered (e.g., power concatenated,modified, etc.).

The method displayed in FIG. 7, FIG. 8, FIG. 9, and FIG. 10 may berealized in a form of a machine-readable medium (e.g., a data processingsystem) embodying a set of instruction (e.g., a software program) that,when executed by a machine, causes the machine to perform the operationsdiscussed herein.

Although the present embodiments have been described with reference to aspecific example embodiment, it will be evident that variousmodifications and changes may be made to these embodiments withoutdeparting from the broader sprit and scope of the embodiments. Forexample, the various microelectronic assemblies, modules, and/or systemsdescribed herein may be performed and created using hardware circuitryof different material, firmware, software and/or any combination ofhardware, firmware, and/or software (e.g., embodied in a machinereadable medium).

In addition, it will be appreciated that the various methods, systems,structures, and/or assemblies disclosed herein may be embodied in amachine-readable medium and/or a machine accessible medium compatiblewith a data processing system (e.g., a computer system). Accordingly,the specification and drawings are to be regarded in an illustrativerather than a restrictive sense.

1. A method, comprising: patterning a nanotube structure adjacent to atransistor layer of an integrated circuit, the transistor layer above asemiconductor substrate comprising a plurality of transistors; supplyingpower to the plurality of transistors through an at least one powersource; and coupling the plurality of transistors in the transistorlayer to the at least one power source based on a state of the nanotubestructure, and wherein coupling the plurality of transistors in thetransistor layer to the at least one power source based on a state ofthe nanotube structure comprising: bending the nanotube structuretowards a conductive surface when a current is applied to the nanotubestructure; coupling the at least one power source to the plurality oftransistors to provide a power to the plurality of transistors throughthe nanotube structure that is bent towards the conductive surface;bending the nanotube structure away from the conductive surface when thecurrent applied to the nanotube structure is removed; decoupling the atleast one power source from the plurality of transistors to remove thepower from the plurality of transistors through the nanotube structurethat is bent away from the conductive surface.
 2. The method of claim 1,further comprising: forming the nanotube structure adjacent to at leastone of a metal layer and the semiconductor substrate, with a depth of atleast 10 nanometers to enable the bending of the nanotube structure; andsputtering a nanotube material over a plurality of layers to form thenanotube structure.
 3. The method of claim 1, further comprising:applying the current to the nanotube structure having a polarity thatindicates at least one of a bending and an expanding of the nanotubestructure; and coupling the plurality of transistors with at least twopower sources that are concatenated together to provide cascaded currentto the plurality of transistors.
 4. The method of claim 1: wherein thebending away of the nanotube structure from the conductive surface isbased on a power utilization rate of the plurality of transistorsmeeting a threshold level; and decoupling the at least one power sourcefrom the plurality of transistors to remove the power from the pluralityof transistors through the nanotube structure that is bent away from theconductive surface.
 5. The method of claim 1 in the form of amachine-readable medium embodying a set of instructions that, whenexecuted by a machine, cause the machine to perform the method ofclaim
 1. 6. A method, comprising: patterning a nanotube structureadjacent to a transistor layer of an integrated circuit, the transistorlayer above a semiconductor substrate comprising a plurality oftransistors; and coupling the plurality of transistors in the transistorlayer to an at least one power source based on a state of the nanotubestructure wherein coupling the plurality of transistors in thetransistor layer to the at least one power source based on a state ofthe nanotube structure comprising: bending the nanotube structuretowards a conductive surface when a current is applied to the nanotubestructure; coupling the at least one power source to the plurality oftransistors to provide a power to the plurality of transistors throughthe nanotube structure that is bent towards the conductive surface;bending the nanotube structure away from the conductive surface when thecurrent applied to the nanotube structure is removed; and decoupling theat least one power source from the plurality of transistors to removethe power from the plurality of transistors through the nanotubestructure that is bent away from the conductive surface.
 7. The methodof claim 6, further comprising: supplying power to the plurality oftransistors through the at least one power source; forming the nanotubestructure adjacent to at least one of a metal layer and thesemiconductor substrate through patterning a carbon nanotube film; andsputtering a nanotube material over at least one of the metal layer andthe semiconductor substrate through a sputtered planar process to createthe nanotube structure.
 8. The method of claim 6, further comprising:applying the current to the nanotube structure having a polarity thatindicates at least one of a bending and an expanding of the nanotubestructure; and coupling the plurality of transistors with at least twopower sources that are concatenated together to provide cascaded currentto the plurality of transistors.
 9. The method of claim 6, wherein theintegrated circuit having a plurality of power sections based on thestate of the nanotube structure and the at least one power source. 10.The method of claim 6: wherein the bending away of the nanotubestructure from the conductive surface is based on a power utilizationrate of the plurality of transistors meeting a threshold level, andwherein the nanotube structure is formed with a depth of at least 10nanometers to enable the bending of the nanotube structure.
 11. Amethod, comprising: patterning a nanotube structure adjacent to atransistor layer of an integrated circuit, the transistor layer above asemiconductor substrate comprising a plurality of transistors; supplyingpower to the plurality of transistors through an at least one powersource; bending the nanotube structure towards a conductive surface whena current is applied to the nanotube structure; coupling the at leastone power source to the plurality of transistors to provide a power tothe plurality of transistors through the nanotube structure that is benttowards the conductive surface; bending the nanotube structure away fromthe conductive surface when the current applied to the nanotubestructure is removed; and decoupling the at least one power source fromthe plurality of transistors to remove the power from the plurality oftransistors through the nanotube structure that is bent away from theconductive surface.
 12. The method of claim 11, further comprising:forming the nanotube structure adjacent to at least one of a metal layerand a silicon substrate through patterning a carbon nanotube film; andcreating the nanotube structure through performing a sputtered planarprocess in a trench of at least one of the metal layer and the siliconsubstrate.
 13. The method of claim 11: wherein the integrated circuithaving a plurality of power sections based on a state of the nanotubestructure and the at least one power source, and wherein the bendingaway of the nanotube structure from the conductive surface is based on apower utilization rate of the plurality of transistors meeting athreshold level.
 14. The method of claim 12, wherein the trench is atleast 10 nanometers in depth to permit the bending of a nanotubematerial.
 15. The method of claim 11, further comprising: applying thecurrent to the nanotube structure having a polarity that indicates atleast one of a bending and an expanding of the nanotube structure; andcoupling the plurality of transistors with at least two power sourcesthat are concatenated together to provide cascaded current to theplurality of transistors.
 16. The method of claim 11, further comprisingenabling a plurality of power regions in the integrated circuit based onat least one of the patterning of the nanotube structure and thecoupling of the plurality of transistors to the at least one powersource.
 17. The method of claim 13, further comprising receiving acommand from a data processing system to set up the state of thenanotube structure.
 18. A method comprising: supplying power to a powerregion of a device through an at least one power source via a nanotubestructure of the device; the power region comprising a plurality oftransistors in a transistor layer above a semiconductor layer of thedevice; providing a default configuration of the power region to thedevice comprising a power region, wherein the default configuration is astate of the power region based on an initial allocation of power to thepower region; monitoring the power region to check for a condition thattriggers a change in the default configuration, the condition thattriggers the change in the default configuration is associated with ausage of the power region; and altering the default configuration basedon the usage of the power region wherein changing the defaultconfiguration of the power region when the parameter reaches thethreshold level, further comprising: bending the nanotube structuretowards a conductive surface when a current is applied to the nanotubestructure; coupling the at least one power source to the plurality oftransistors to provide a power to the plurality of transistors throughthe nanotube structure that is bent towards the conductive surface;bending the nanotube structure away from the conductive surface when thecurrent applied to the nanotube structure is removed; and decoupling theat least one power source from the plurality of transistors to removethe power from the plurality of transistors through the nanotubestructure that is bent away from the conductive surface.
 19. The methodof claim 18, further comprising: monitoring a parameter that indicates alevel of the usage of the power region, the level of usage associatedwith the condition that triggers the change in the defaultconfiguration; determining when the parameter that indicates the levelof usage of the power region reaches a threshold level; and changing thedefault configuration of the power region when the parameter reaches thethreshold level.
 20. The method of claim 19, wherein changing thedefault configuration of the power region when the parameter reaches thethreshold level, further comprising: removing a supply of power to thepower region when the parameter is associated with a power removal fromthe power region; providing the supply of power to the power region whenthe parameter is associated with a power enablement of the power region;and switching the supply of power to the power region from a powersource of the at least one power source to another power source of theat least one power source when the parameter is associated with aswitching of power to the power region.
 21. The method of claim 19,wherein changing the default configuration of the power region when theparameter reaches the threshold level, further comprising: removing asupply of a current to the nanotube structure when the parameter isassociated with a current removal to the nanotube structure; providingthe supply of the current to the nanotube structure when the parameteris associated with a current adding to the nanotube structure; andmonitoring another power region of the device to check for a conditionthat triggers a change in the default configuration of the other powerregion when monitoring the power region to check for a condition thattriggers a change in the default configuration of the power region iscompleted.